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为了研制高激光性能紫外增透膜,分别使用HfO2/SiO2和Al2O3/MgF2两种高低折射率材料组合,采用物理气相沉积技术,设计制备了266 nm增透膜;分析测试了不同材料所组成的增透膜的剩余反射率、粗糙度、光学损耗、界面电场强度和激光诱导损伤阈值等特性。研究结果表明,两组不同膜料制备的266 nm增透膜都能达到剩余反射率<0.2%的要求,且激光诱导损伤阈值都大于5 J/cm(2266 nm,7 ns)。
In order to develop a high laser performance UV-AR coating, a 266 nm AR coating was designed and fabricated by using two high and low refractive index materials, HfO2 / SiO2 and Al2O3 / MgF2 respectively. AR reflectivity, roughness, optical loss, interface electric field strength and laser-induced damage threshold and other characteristics. The results show that the 266 nm AR coatings prepared by two different membrane materials can meet the requirement of residual reflectance <0.2%, and the laser induced damage thresholds are both greater than 5 J / cm (2266 nm, 7 ns).