高低温热处理溶胶凝胶SiO_2减反膜的稳定性

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以正硅酸乙酯作为前驱体,乙醇作为溶剂通过溶胶凝胶法制备了二氧化硅悬浮液,经粒径测试观察了溶胶体系的平衡稳定性,颗粒粒径在4个月的时间内基本保持在6.5nm左右。运用提拉法以一定的速度在石英玻璃基片上涂膜,分别进行200℃和800℃马弗炉热处理。经过800℃热处理的膜层透过率曲线向短波方向移动,两者透过率峰值波长相差近210nm,但透过率峰值均超过99.8%,光学性能优异。在不同湿度环境下研究不同温度热处理的膜层稳定性,200℃热处理的膜层在不同湿度环境下透过率均大于99.9%,膜层峰值波长在高湿度环境中减小约150nm;800℃热处理的膜层在高湿度环境下透过率下降0.3%,膜层峰值波长基本保持在600nm。 The silica suspension was prepared by sol-gel method using ethyl orthosilicate as precursor and ethanol as solvent. The equilibrium stability of the sol system was observed by particle size test. The particle size of the silica sol was basically within 4 months Keep at about 6.5nm. Using Czochralski method to a certain speed on the quartz glass substrate coating, were 200 ℃ and 800 ℃ muffle furnace heat treatment. After the heat treatment at 800 ℃, the transmittance curve of the film moved in the direction of shortwave. The difference between the two was about 210 nm, but the peak transmittance was more than 99.8%, which indicated that the optical properties were excellent. Under different humidity conditions, the stability of the films treated with different temperature was studied. The transmittance of the films at 200 ℃ under different humidity was more than 99.9% and the peak wavelength of the film was reduced by about 150nm under high humidity. The heat treatment of the film in high humidity environment, the transmittance decreased by 0.3%, the peak wavelength of the film remained at 600nm.
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