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This paper investigates the procedure of cubic boron nitride (cBN) thin film delamination by Fourier-transform infrared (IR) spectroscopy.It finds that the apparent IR absorption peak area near 1380 cm 1 and 1073 cm 1 attributed to the B-N stretching vibration of sp 2-bonded BN and the transverse optical phonon of cBN,respectively,increased up to 195% and 175% of the original peak area after film delamination induced compressive stress relaxation.The increase of IR absorption of sp 2-bonded BN is found to be non-linear and hysteretic to film delamination,which suggests that the relaxation of the turbostratic BN (tBN) layer from the compressed condition is also hysteretic to film delamination.Moreover,cross-sectional transmission electron microscopic observations revealed that cBN film delamination is possible from near the aBN(amorphous BN)/tBN interface at least for films prepared by plasma-enhanced chemical vapour deposition.
This paper investigates the procedure of cubic boron nitride (cBN) thin film delamination by Fourier-transform infrared (IR) spectroscopy. It has been found that the apparent IR absorption peak area near 1380 cm 1 and 1073 cm 1 attributed to the BN stretching vibration of sp 2-bonded BN and the transverse optical phonon of cBN, respectively, increased up to 195% and 175% of the original peak area after film delamination induced compressive stress relaxation. The increase of IR absorption of sp 2 -bonded BN is found to be non-linear and hysteretic to film delamination, which suggests that the relaxation of the turbostratic BN (tBN) layer from the compressed condition is also hysteretic to film delamination. More than, cross-sectional transmission electron microscopic observations that that cBN film delamination is possible from near the aBN (amorphous BN) / tBN interface at least for films prepared by plasma-enhanced chemical vapor deposition.