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以248 nm的KeF准分子激光器为光源,基于相位掩模法,研究了大模场面积双包层光纤(LMA-DCF)光栅的刻写技术。在20/400μm的LMA-DCF中制备出中心波长1076.11 nm,基模反射率大于99.9%,3 dB带宽0.32 nm的光纤布拉格光栅(FBG)。用已制备的FBG作为腔镜,采用分立的光学元件后向抽运掺Yb3+光纤激光器,实现了144 W的稳定激光输出,斜率效率为60%,输出激光光谱特性同FBG的光谱特性一致。
The KeF excimer laser with 248 nm was used as the light source. Based on the phase mask method, the writing technology of large mode area double clad fiber (LMA-DCF) grating was studied. A fiber Bragg grating (FBG) with center wavelength of 1076.11 nm, fundamental mode reflectivity of more than 99.9% and 3 dB bandwidth of 0.32 nm was prepared in 20/400 μm LMA-DCF. The fabricated FBG was used as a cavity mirror, and the Yb3 + fiber laser was pumped back using separate optical elements to achieve a stable laser output of 144 W with a slope efficiency of 60%. The output laser spectrum was consistent with that of FBG.