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结合对向靶直流磁控溅射技术、微电子光刻方法和原子力显微镜阳极氧化加工方法制备了实用的纳米钛-钛氧化线-钛隧道结,钛膜的厚度为3·02nm.钛氧化线的宽度为60·5nm,在室温下此隧道结的I-V曲线表现出明显的库仑阻塞效应.
A practical nano-titanium-titanium oxide-titanium tunnel junction was prepared by direct-current magnetron sputtering, microelectronic lithography and atomic force microscopy anodic oxidation. The thickness of the titanium film was 3.02 nm. The width of 60.5nm, at room temperature, the tunnel junction IV curve showed a significant Coulomb blockade effect.