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光刻是大规模集成电路制造过程中最为关键的工艺,光刻的分辨力主要取决于光刻投影物镜的光学性能。光刻投影物镜光学元件面形精度为纳米量级,其对光学元件的加工及物镜单镜支撑提出了极高的要求。为193nm光刻投影物镜高精度的单镜面形,设计了一种运动学单镜支撑结构。运用有限元法(FEM)分析光刻投影物镜单镜运动学支撑结构在重力下物镜镜片的面形变化量,经分析物镜镜片的峰值(PV)值为15.46nm,均方根(RMS)误差为3.62nm。为了验证有限元计算精度,建立了可去除参考面面形及被测面原始面形的方法。经过分析对比,仿真结果与实验结果面形的PV值为2.356nm,RMS误差为0.357nm。研究结果表明,所设计的基于运动学193nm光刻投影物镜单镜支撑结构能够满足193nm光刻投影物镜系统对于物镜机械支撑结构的要求。
Lithography is the most critical process in the manufacture of large scale integrated circuits. The resolution of lithography depends mainly on the optical properties of the lithography projection objective. Photolithographic projection lens surface accuracy of nano-nano-scale, its processing of optical components and lens monocular support put forward very high requirements. For 193nm lithography projection objective high-precision single mirror, designed a kinematic single-lens support structure. The change of the shape of the lens of the objective lens under the gravitational force was analyzed by finite element method (FEM). The peak value (PV) of the objective lens was 15.46 nm, and the RMS error 3.62 nm. In order to verify the accuracy of finite element calculation, a method of removing the reference surface and the original surface of the measured surface is established. After analysis and comparison, the simulation results and the experimental results of the shape of the PV value of 2.356nm, RMS error of 0.357nm. The results show that the designed 193nm lithography projection lens based on single lens support structure can meet the requirements of 193nm lithography projection lens system for mechanical support structure of objective lens.