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介绍和表征了一种制作聚二甲基硅氧烷(PDMS)软模板的工艺方法,并实现了非平面微加工工艺的图形转移。首先采用深硅电感耦合等离子体(ICP)刻蚀工艺制备了具有图形的硅片硬母版,然后用PDMS对硅片硬母版进行倒模复制,从而得到具有图形的PDMS软模板。对所制备的PDMS软模板和硅片硬母版结构的形貌、结构尺寸进行观测对比,结果显示PDMS软模板成功复制了硅片上的图形。将α-氰基丙烯酸乙酯旋涂到PDMS软模板上,然后将PDMS软模板上的图形转印到航空发动机叶片表面进行二次复制。在叶片表面得到的图形化结果为MEMS传感器的制作打下了坚实的基础。本实验提出的这种用PDMS转印的软光刻工艺可代替传统的光刻工艺,能够普遍适用于曲表面的三维结构集成制造。
A process for making PDMS soft template was introduced and characterized, and the pattern transfer of non-planar micro-fabrication process was realized. Firstly, a patterned silicon wafer hardmask was prepared by a deep silicon inductively coupled plasma (ICP) etching process, and then a PDMS soft template with a pattern was obtained by using PDMS to mold the silicon wafer hardstock. The morphologies and structure dimensions of the prepared PDMS soft template and the silicon wafer hardmask structure were observed and compared. The results show that the PDMS soft template successfully replicated the pattern on the silicon wafer. The α-cyanoethyl acrylate was spin-coated onto a PDMS soft template, and the pattern on the PDMS soft template was then transferred to the aero-engine blade surface for secondary replication. The graphical results obtained on the blade surface provide a solid foundation for MEMS sensor fabrication. This experiment proposed by the PDMS transfer of soft lithography process can replace the traditional lithography process, can be generally applied to the curved surface of the three-dimensional structure of integrated manufacturing.