中国科学院光电技术研究所顺利完成新一代单场超大面积光刻机(650mm×650mm)研制,并通过了用户验收,各项技术指标达到国际先进水平。其成功研制对于提升我国微细加工设备整体研制水平,促进我国单场超大面积极端微细加工技术发展具有重要的意义。新一代超大面积光刻机采用2500W大功率高压汞灯作为光源,利用离轴非球面反射镜,结合蝇眼 Institute of Photoelectric Technology, Chinese Academy of Sciences successfully completed the development of a new generation of single-area ultra-large area lithography machine (650mm × 650mm) developed and passed user acceptance, the technical indicators have reached the international advanced level. The successful development of our micro-processing equipment to enhance the overall level of research and development to promote China’s ultra-large area ultra-micro processing technology is of great significance. A new generation of large area lithography machine using 2500W high-power high-pressure mercury lamp as a light source, the use of off-axis aspherical mirror, combined with fly eyes