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碳氮化合物（ＣＮ）是经理论预测的、硬度有可能超过金刚石的非天然共价化合物。该文使用反应离化团束（ＲＩＣＢ）方法，以低分子量聚乙烯为蒸发源材料，氮气为反应气体，在Ｓｉ（１１１）衬底上生长了ＣＮ薄膜。用激光喇曼（Ｒａ－ｍａｎ）散射分析了薄膜中的成键情况。结果表明，当氮气分压为１３．３ｍＰａ时，在波数１２４８ｃｍ－１附近出现源于共价Ｎ—Ｃ单键的喇曼峰，而且该峰强度随氮气分压的增加而增加。这个结果与Ｘ射线光电子能谱（ＸＰＳ）分析结果是一致的。硬度测定结果表明，生长的ＣＮ薄膜的努氏显微硬度最高可达６１ＧＰａ。在无润滑条件下进行滑动摩擦试验，测得的摩擦因数最低为～０．０８。
Carbonitride (CN) is a non-native covalent compound that is theoretically predicted to have a higher hardness than diamond. In this paper, reactive ionization cluster beam (RICB) method is used in this paper. Low molecular weight polyethylene is used as the evaporation source material, and nitrogen is used as a reactive gas to grow a CN thin film on a Si (111) substrate. Bonding in the film was analyzed by laser Raman scattering. The results showed that Raman peaks originated from the covalent N-C single bond near the wave number 1248cm-1 when the nitrogen partial pressure was 13.3mPa, and the peak intensity increased with the increase of nitrogen partial pressure. This result is consistent with the X-ray photoelectron spectroscopy (XPS) analysis. Hardness measurement results show that the growth of CN film Knurle microhardness up to 61GPa. The sliding friction test was performed without lubrication, with a friction factor of ~ 0.08 measured.