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用1.064μm波长的单脉冲(6 ns)激光对K9玻璃基底上电子束沉积的单层SiO2薄膜进行了辐照损伤实验。以扫描电镜对K9基底的断面进行分析,并采用表面热透镜装置对膜层中的缺陷进行了检测,最后采用Matlab偏微分工具箱对缺陷的散射光光场进行了有限元模拟。实验研究表明:膜层中存在缺陷,基底中也存在大量缺陷。模拟研究表明:缺陷的位置越深,形成的条纹间距也越宽;当缺陷的形状不规则时,在局部出现近似平行的纹波结构;当缺陷的数目增加时,这些缺陷的散射光的叠加就形成相互叠加的条纹。
Single-pulse (6 ns) laser with 1.064μm wavelength was used to study the electron beam deposition on K9 glass substrate. Scanning electron microscope (SEM) was used to analyze the cross section of K9 substrate. The surface thermal lens was used to detect the defects in the film. Finally, the finite element simulation of the scattered light field was carried out by Matlab partial differential toolbox. Experimental studies have shown that there are defects in the film, there are a lot of defects in the substrate. The simulation results show that the deeper the positions of the defects, the wider the stripe spacing. When the shapes of the defects are irregular, local parallel ripple structures appear locally. When the number of defects increases, the superposition of the scattered light of these defects The formation of superimposed stripes.