Au掺杂碲镉汞气相外延生长及电学性能

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采用气相外延技术生长Au掺杂的Hg1-xCdxTe薄膜材料,利用范德堡法对薄膜材料进行电学性能表征.通过变温霍尔测量,分析了常规Au掺杂p型薄膜的霍尔系数和霍尔迁移率随温度的变化,利用二次离子质谱(SIMS)分析薄膜中Au的纵向分布趋势.讨论了三种反常p型薄膜的霍尔系数和霍尔迁移率随温度的变化.通过变磁场霍尔测量,分析了具有反型层Hg1-xCdxTe薄膜的迁移率谱,证实了由于表面电子、体电子以及体空穴混合导电造成的反常霍尔性能.
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