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用苯作为源气体 ,使用微波电子回旋共振 (ECR)等离子体气相沉积法在不同温度下制备了含氢非晶碳薄膜 ,研究了沉积温度对薄膜的直流电阻率、击穿场强的影响 ,发现它们与沉积速率密切相关 .测量了薄膜的含氢量与Raman谱 ,利用Angus等人提出的随机共价网络模型对结果作了分析
Hydrogen-containing amorphous carbon thin films were prepared at different temperatures by using microwave electron cyclotron resonance (ECR) plasma vapor deposition with benzene as the source gas. The effects of deposition temperature on the DC resistivity and breakdown field strength of the films were investigated. And found that they are closely related to the deposition rate.The hydrogen content and Raman spectra of the films were measured and the results were analyzed using the stochastic covalent network model proposed by Angus et al