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研究哈氏C-2000合金在(800°C,1000 h)和(1000°C,100 h)时的氧化行为。分别利用增重法、SEM、XRD和XPS表征氧化动力学和氧化膜的形貌特征。合金在800°C和1000°C时均基本满足抛物线速率规律。此外,由于退火孪晶提高了合金化元素及氧原子的扩散速率,因此,降低了合金的高温抗氧化性能。在800°C时,氧化膜微观结构主要是由NiO和Cr1.3Fe0.7O6组成。此外,初始退火孪晶结构在氧化后依然可见,且临近氧化膜附近出现了富Mo相。然而,在1000°C时,氧化膜的微观结构由细小的铬氧化物和粗大的镍氧化物颗粒通过相互镶嵌而构成,同时,在临近氧化膜处几乎无富Mo相出现。
The oxidation behavior of Hastelloy C-2000 alloy at (800 ° C, 1000 h) and (1000 ° C, 100 h) was studied. The oxidation kinetics and the morphologies of the oxide films were characterized by weight gain method, SEM, XRD and XPS, respectively. Alloy at 800 ° C and 1000 ° C are basically meet the parabolic rate law. In addition, since the annealing twin increases the diffusion rate of alloying elements and oxygen atoms, the high temperature oxidation resistance of the alloy is reduced. At 800 ° C, the microstructure of the oxide film is mainly composed of NiO and Cr1.3Fe0.7O6. In addition, the initial annealing twin structure is still visible after oxidation, and the Mo-rich phase appears near the oxide film. However, at 1000 ° C, the microstructure of the oxide film is composed of fine chrome oxide and coarse nickel oxide particles interlaced with each other, while almost no Mo-rich phase occurs near the oxide film.