一、前言将碳膜沉积在各种不同材料的衬底上,在适当条件下,可生长出非常坚硬的绝缘薄层。用离子束技术,溅射法,碳氢聚合物的等离子沉积(射频或直流)等方法均可制备此类膜层。从生产的角度出发,碳氢聚合物射频等离子沉积法更适于制备衬底面积较大而均匀的绝缘膜(适当控制参数也可制备导电膜),这种方法的沉积速率较高。人们从各自不同的角度出发,对 I. Preface The carbon film deposited on a variety of substrates of different materials, under appropriate conditions, can grow a very hard insulating sheet. Such films can be prepared by ion beam techniques, sputtering methods, plasma deposition of hydrocarbon polymers (radio frequency or direct current), and the like. From a production point of view, the RF plasma RF plasma deposition method is more suitable for the preparation of large substrate area uniform insulating film (appropriate control parameters can also be prepared conductive film), this method of deposition rate is higher. People from different perspectives, right