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Hersch电极的商品仪器,最低检出量约0.1ppm左右。但半导体材料研究要求能检出气体中含氧量低至0.02ppm。并要求测定含有掺杂气体中的氧。为此本工作对Hersch电极进行了研究,提出能检测0.005ppm氧的仪器系统。仪器设计仪器结构如图1.为避免反应器中氧在低氧环境中扩散出来,采用玻璃结构。待测气体如含有能和电极起反应的杂质(如As、Zn、Al、P……),应避免待测气体大量通过电极,使电极中毒,采用取样10毫升,然后用纯氩气作载体,读取峰值电流。本仪器测定量为ppm以
Hersch electrode of the commodity equipment, the minimum detection rate of about 0.1ppm or so. However, research on semiconducting materials requires the detection of as little as 0.02 ppm oxygen in the gas. And requires determination of oxygen in the doping gas. For this work, Hersch electrodes were studied, and an instrument system capable of detecting 0.005 ppm oxygen was proposed. Instrument design Instrument structure shown in Figure 1. In order to avoid the oxygen in the reactor in a low-oxygen environment, the use of glass structure. The gas to be measured contains impurities that can react with the electrode (such as As, Zn, Al, P, ...). A large amount of gas to be measured should be prevented from passing through the electrode to poison the electrode. A sample of 10 ml is used and then pure argon is used as a carrier , Read the peak current. The instrument measured in ppm