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从微观输运与化学反应动力学出发,将薄膜气相生长过程划分为五个步骤,基于对步骤的分析,得到了淀积过程的共同规律,建立了气相淀积生长速率的统一模型.代入有关参数和少数实验数据即可得到具体的实用模型.文中揭示的薄膜生长规律对于优选工艺方法和具体工艺参数具有参考意义.
Based on the microscopic transport and chemical reaction kinetics, the thin film vapor growth process is divided into five steps. Based on the analysis of the steps, the common law of deposition process is obtained and a uniform model of the growth rate of the vapor deposition is established. Parameters and a small number of experimental data can get a concrete practical model.The text reveals the law of film growth for the preferred process methods and specific process parameters with reference.