本文全面讨论了多层法用于表面的高分辨电子显微平面像模拟计算中的各种影响因素以及需要注意的技术细节。包括光阑大小、欠焦量、样品厚度、色差与束发散度、吸收系数等的影响，为今后进一步利用这种方法在原子水平上对表面结构进行观测提供了有用的结果 This paper comprehensively discusses the various factors that affect the simulation of high resolution electron micrographs of the surface and the technical details that need attention. Including aperture size, under-focus, sample thickness, color difference and beam divergence, absorption coefficient and so on, which will provide useful results for the further use of this method to observe the surface structure at the atomic level in the future