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激光热刻蚀技术是近年发展起来的利用激光热刻蚀薄膜的热变化阈值特性突破光学衍射极限进行纳米图形制备的新技术,在亚波长纳米结构器件和高密度光盘母盘制造等领域具有广阔的应用前景。阐述了激光热刻蚀技术的基本原理和特点,以及对激光热刻蚀材料性质的要求,综述了相变型激光热刻蚀薄膜材料(包括硫系相变薄膜材料、金属亚氧化物薄膜材料和陶瓷复合薄膜材料)、热分解型激光热刻蚀薄膜材料和化学反应型激光热刻蚀薄膜材料的最新研究进展。分析并总结了无机激光热刻蚀材料的激光热刻蚀机制,在此基础上对无机激光热刻蚀材料的发展趋势和前景进行了探讨。
The laser thermal etching technology is a new technique that has been developed in recent years to make use of the thermal threshold threshold characteristics of laser thermal etching film to break through the limit of optical diffraction for nano-pattern preparation. It has a wide range of applications in sub-wavelength nanostructured devices and high-density optical disk mastering The application prospects. The basic principles and characteristics of the laser thermal etching technology and the requirements for the material properties of the laser thermal etching are expounded. The phase change laser thermal etching thin film materials (including sulfur-based phase-change film materials, metal-oxide film materials And ceramic composite thin film materials), pyrolytic laser thermal etching thin film materials and chemical reaction type laser thermal etching thin film materials, the latest research progress. The laser thermal etching mechanism of inorganic laser thermal etching material is analyzed and summarized. On the basis of this, the development trend and prospect of inorganic laser thermal etching material are discussed.