论文部分内容阅读
采用光电化学方法和交流阻抗方法将不同浓度的 BTA(苯并三氮唑 )和 4CBTA( 4 -羧基苯并三氮唑 )在硼砂缓冲溶液 ( p H9.2 )中对铜电极的缓蚀性能作了比较。发现在阳极向电位扫描中 ,一定浓度的 BTA作用下 ,铜电极光响应由 p型转化为 n型 ,并可依此判断缓蚀剂的缓蚀性能 ,n型光响应越大 ,缓蚀剂的缓蚀性能越好 ;而在 4CBTA作用下 ,铜电极光响应保持 p型 ,然其阴极向扫描中最大光电流变化明显 ,并可据此判断缓蚀剂的缓蚀性能 ,最大阴极光电流愈大 ,缓蚀效果越好。同时这两种缓蚀剂均可用 Φv 和某一较负电位下的阴极光电流 iph的大小来判断缓蚀剂的缓蚀性能 ,Φv 和 iph越负 ,缓蚀性能越好 ,交流阻抗方法的结果和光电化学的结果相一致。
Corrosion Inhibition of Copper Electrode with BTA (Benzotriazole) and 4CBTA (4 - Carboxybenzotriazole) in Borax Buffer Solution (p H9.2) by Photoelectrochemical Method and AC Impedance Method Made a comparison. It was found that under the action of BTA, the photoresponse of copper electrode changed from p-type to n-type under the action of BTA at a certain concentration, and the corrosion inhibition performance of the corrosion inhibitor could be judged accordingly. The larger the n-type photoresponse, The corrosion resistance of copper electrode is better under the action of 4CBTA, while the photoresponse of copper electrode remains p-type, however, the maximum photocurrent change from cathodic scan to cathodic scan is obvious, and the corrosion inhibition performance of corrosion inhibitor, the maximum cathodic photocurrent The larger, the better the corrosion inhibition. At the same time, both of these corrosion inhibitors can be used Φv and a more negative potential of the cathode photocurrent iph size to determine the corrosion inhibitor corrosion inhibition, Φv and iph more negative, the better the corrosion resistance, the AC impedance method The results are consistent with the results of photoelectrochemistry.