论文部分内容阅读
本文扼要地评述了俄歇电子能谱定量分析的最新进展及其存在问题。首先评述了第一原理模型的俄歇电子能谱的物理基础,并分别对其中各种参数进行估算。同时,对以下专题进行了讨论。 1.利用俄歇电子能谱进行表面定量分析的方法;样品均匀性;强度的确定;带电效应;束流对样品的损伤。 2.对限制深度分布定量计算的各种现象进行了讨论。例如,溅射速率;表面原生粗糙度和束流引起的粗糙度;撞击和原子混合效应;择优溅射;离子束激发的俄歇电子能谱等。对于这些现象对深度分辨率的影响及其对溅射深度的依赖关系进行了讨论。
This article briefly reviews recent developments and problems in the quantitative analysis of Auger electron spectroscopy. Firstly, the physical basis of the Auger electron spectroscopy of the first principle model is reviewed, and various parameters of the first principle model are estimated. At the same time, the following topics were discussed. 1. The use of Auger electron spectroscopy surface quantitative analysis methods; sample uniformity; strength determination; charged effect; beam damage to the sample. The various phenomena that limit the quantitative calculation of depth distribution are discussed. For example, the sputtering rate; surface roughness and roughness caused by the beam; impact and atomic mixing effect; preferential sputtering; ion beam-excited Auger electron spectroscopy. The effects of these phenomena on depth resolution and their dependence on the sputtering depth are discussed.