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采用多弧离子镀技术于不同负偏压条件下在锆合金表面沉积纯Cr涂层。利用扫描电子显微镜、X射线衍射仪和划痕仪分析了纯Cr涂层表面形貌和择优生长取向变化规律,并对涂层膜基结合力进行表征。结果表明:负偏压不同,纯Cr涂层上液滴分布和择优生长取向都有较大的影响。其中随着负偏压的增加,纯Cr涂层表面液滴的数量和尺寸先减少后增加的趋势,同时纯Cr涂层晶体择优生长趋势由(200)晶面转向(110)晶面;纯Cr涂层的膜/基结合力随负偏压的增加逐渐增大。
Multi-arc ion plating technology was used to deposit pure Cr coating on the surface of zirconium alloy under different negative bias conditions. The surface morphology and preferred growth orientation of pure Cr coating were analyzed by scanning electron microscopy, X-ray diffraction and scratch tester, and the bonding strength of the coating was characterized. The results show that the distribution of droplets and the orientation of preferred growth are all influenced by the negative bias voltage. With the increase of negative bias, the number and size of droplets on the surface of pure Cr coating decrease first and then increase, meanwhile, the preferred growth trend of pure Cr coating crystal changes from (200) plane to (110) plane; pure The film / substrate bond strength of Cr coating gradually increases with the increase of negative bias voltage.