为了研究波长为２５５．３ｎｍ的铜蒸气激光倍频光在亚微米光刻中的可行性，设计了带宽为１ｎｍ的１１折反射式投影光刻物镜和一个带散射板的光管式均匀照明系统，获得了０．６μｍ的光刻分辨率。此结果表明，铜激光倍频光可作为亚微米光刻的照明光源 In order to study the feasibility of sub-micron photolithography of copper vapor laser with a wavelength of 255.3nm, an 11-fold reflective projection lithography objective with a bandwidth of 1nm and a uniform illumination system with a diffuser , A lithographic resolution of 0.6 μm was obtained. The results show that the copper laser doubling light can be used as a sub-micron lithography light source