Image lithography in telluride suboxide thin film through controlling “virtual” bandgap

来源 :Photonics Research | 被引量 : 0次 | 上传用户:saif108
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In this work, TeO_(0.7)thin films were prepared by the reactive magnetron-controlling sputtering method. Complex gray-scale patterns were successfully fabricated on TeO_(0.7)thin films through the laser direct writing method.The structural origin of TeO_(0.7)thin film was investigated for gray-scale pattern formation. It is found that multiple gray-scale levels are dependent on the “virtual” bandgap energy of TeO_(0.7)thin films. The bandgap energy changes lead to refractive index and reflectivity difference. Thus, gray-scale tones can be formed. By accurately controlling laser energy, various “virtual” bandgaps can be generated in TeO_(0.7)thin films, and colorful gray-scale levels can be formed. Experimental results indicate that TeO_(0.7)thin film can be used as micro/nano image writing material. In this work, TeO 0.7 thin films were prepared by the reactive magnetron-controlling sputtering method. The complex gray-scale patterns were successfully fabricated on TeO 0.7 thin films through the laser direct writing method. The structural origin of TeO 0.7 It is found that multiple gray-scale levels are dependent on the “virtual” bandgap energy of TeO_ (0.7) thin films. The bandgap energy changes lead to refractive index and reflectivity By accurately controlling laser energy, various “virtual” bandgaps can be generated in TeO_ (0.7) thin films, and colorful gray-scale levels can be formed. Experimental results indicate that that TeO_ (0.7) thin film can be used as micro / nano image writing material.
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