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高重复频率激光等离子体软X射线光刻术是国际上制作亚微米及深亚微米量级微器件、微结构的关键技术方法之一。目前国内尚未见有关报道。 本文建立的激光等离子体软x射线曝光实验装置(图1)主要由软X射线源和曝光室组
High repetition rate laser plasma soft X-ray lithography is one of the key technologies for making submicron and deep sub-micron micro-devices and microstructures in the world. At present, no relevant reports have been seen in China. The experimental setup of laser plasma soft X-ray exposure (Figure 1) is mainly composed of soft X-ray source and exposure chamber group