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用Ｘ射线衍射线对法测量了具有强Ｃ轴择优取向的ＹＢＣＯ厚膜的点阵常数Ｃ。用Ｎｉ基带制备的样品的点阵常数值小于过去报导过的烧结样品的点阵常数Ｃ值，也小于用Ａｇ—Ｐｄ基带制备的样品的点阵常数ｃ值。喷雾时基带加热温度的升高，喷雾后烧结温度的提高，和区熔时样品移动速度的加快，都使样品点阵常数ｃ降低。一般来说，具有较高Ｔｃ值的样品具有较低的点阵常数ｃ值．
The lattice constant C of a YBCO thick film with a strong C-axis preferred orientation was measured by X-ray diffraction line-alignment. The lattice constant values of the samples prepared with Ni matrix were smaller than the lattice constant C of the sintered samples reported in the past and smaller than the lattice constant c of the samples prepared with Ag-Pd matrix. The heating temperature of the substrate during spraying increased, the sintering temperature increased after spraying, and the speed of sample moving in zone melting accelerated the sample lattice constant c. In general, samples with higher Tc values have lower lattice constant c values.