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用慢正电子束 (SPEB)对自制ZrO2 薄膜进行了成分分析 .结果发现 ,ZrO2 薄膜表层存在一个厚约2 0nm的高正电子吸收层 ,该表层的特殊结构与Y在表层的偏聚有关 .高于 5 0 0℃的退火处理可以大大减小该层的厚度 .
The composition of self-made ZrO2 thin films was analyzed by slow positron beam (SPEB). The results showed that there was a 20 nm thick positron absorbing layer on the surface of ZrO2 thin films. The special structure of ZrO2 films was related to the segregation of Y in the surface layer. Annealing above 5000C can greatly reduce the thickness of the layer.