论文部分内容阅读
提出一种基于空间像峰值光强差的光刻投影物镜奇像差测量技术。根据Hopkins部分相干成像理论,推导双缝图形空间像光强分布以及峰值光强差的解析表达式。该测量技术以双缝图形为测量标记,以空间像峰值光强差为测量对象。与基于成像位置偏移量的奇像差测量技术相比,基于峰值光强差的奇像差测量技术降低了对空间像定位精度的要求,并且高精度的光强度测量有效地提高了该技术的奇像差测量精度。利用光刻仿真软件PROLITH分析了传统照明与二极照明方式下该技术的奇像差测量精度,仿真结果表明采用二极照明具有更高的测量精度。以彗差Z7为例,在传统照明和二极照明方式下,Z7的测量精度分别达到了0.29nm与0.19nm。
A novel aberrometry aberration measurement technique based on the difference of peak light intensity in space is proposed. According to the Hopkins partial coherence imaging theory, the analytical expressions of the light intensity distribution and the peak light intensity difference of the double-slit graphic space are deduced. The measurement technology to double-seam graphics for the measurement of the mark, the spatial peak intensity difference as the measurement object. Compared with the aberration measurement technique based on imaging position shift, the aberration measurement technique based on peak light intensity reduces the requirement of space image positioning accuracy, and the high precision light intensity measurement effectively improves the technique The odd aberration measurement accuracy. The lithography simulation software PROLITH is used to analyze the aberration measurement accuracy of this technology under the traditional illumination and the diode illumination. The simulation results show that the diode illumination has a higher accuracy. Taking coma Z7 as an example, the measurement accuracy of Z7 reaches 0.29 nm and 0.19 nm respectively under the conventional illumination and the diode illumination mode.