采用射频磁控溅射方法,分别在0.5Pa,1.0Pa,1.5Pa以及2.0Pa的溅射压强下制备出了Sc:ZnO(SZO)薄膜,并用X射线衍射仪、扫描电子显微镜、紫外可见光分光光度计等设备对样品的晶体结构、表面形貌及光学性质进行了表征。结果表明,当溅射压强为1.5Pa时,SZO薄膜沿平行于衬底的(100)方向择优生长,形成了织构化的表面形貌,陷光效果增强,可见光透过率达到87%,同时其光散射能力也有了显著提高。 The films of Sc: ZnO (SZO) were prepared by RF magnetron sputtering at sputtering pressure of 0.5 Pa, 1.0 Pa, 1.5 Pa and 2.0 Pa, respectively. The films were characterized by XRD, SEM and UV - visible spectroscopy Photometer and other equipment on the sample crystal structure, surface morphology and optical properties were characterized. The results show that when sputtering pressure is 1.5 Pa, the SZO thin films preferentially grow along the (100) direction parallel to the substrate to form a textured surface morphology with enhanced trapping effect, visible light transmittance of 87% At the same time its light scattering ability has also been significantly improved.