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在扫描探针纳米加工技术的基础上,提出了利用原子力显微镜(AFM)来制作高频光栅的新工艺。利用AFM硅制探针,在接触模式下对光盘(聚碳酸酯材料)进行刻划试验。对刻划光栅的工艺参数进行优化,得到了纳米量级光栅。并将刻划所得光栅应用于数字云纹法,与数字参考栅干涉形成微/纳米数字云纹。实验结果表明,该法所制得的光栅可以应用于实际变形的测量。
Based on the scanning probe nanofabrication technology, a new technology of making high frequency grating by atomic force microscope (AFM) is proposed. The optical disk (polycarbonate material) was scored in contact mode using an AFM silicon probe. The process parameters of the grating are optimized, and the nanometer order grating is obtained. The gratings were applied to digital moiré and interfered with the digital reference grid to form micro / nano digital moiré. Experimental results show that the grating produced by this method can be applied to the actual deformation measurement.