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自行研制了一台用于低压反应离子镀的以硼化镧 ( La B6)材料作阴极发射体的等离子源。介绍了该设备的工作原理 ,给出了设计参数的选择依据和具体结构形式 ,测量了放电电流与阴极加热功率、偏置电压、气体流量、励磁线圈电流的关系。该设备已与国产箱式真空镀膜机联调成功
A plasma source for lanthanum boride (LaB6) as a cathode emitter for low pressure reactive ion plating has been developed. The working principle of the equipment is introduced. The selection basis and specific structure of the design parameters are given. The relationship between discharge current and cathode heating power, bias voltage, gas flow and excitation coil current is measured. The device has been successfully combined with domestic box vacuum coating machine