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据《Simeconductor FPD World》2009年第2期报道,日本新能源产业综合开发机构(NEDO)在开发了半导体先进技术-Selete的同时,又成功开发了具有世界顶级性能的Low-K绝缘膜材料的实用化技术。该项技术得到了三井化学、产综研、NEC电子的技术支持。这是一种适用于32nm以后的低介电率
According to “Simeconductor FPD World” 2009 the second period reported that Japan's New Energy Industry Development Corporation (NEDO) in the development of the semiconductor advanced technology-Selete at the same time, has successfully developed the world's top performance Low-K insulating film material Practical technology. The technology has been Mitsui Chemicals, research and development, NEC Electronics technical support. This is a low dielectric constant for 32nm