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本文描述了一种用于聚焦离子束系统的图形发生器和自动套准系统的研究和实现，并探讨了发展和改进的方向．该系统采用硬件实现扫描控制和坐标变换．在我们的实验条件下，实现了单场扫描2秒钟，套准计算4秒钟．该系统同样也适用于电子束曝光机系统。
This paper describes the research and implementation of a pattern generator and automatic registration system for focused ion beam systems and explores the direction of development and improvement. The system uses hardware to achieve scan control and coordinate transformation. Under our experimental conditions, we achieved a single field scan for 2 seconds and register for 4 seconds. The system is also suitable for electron beam lithography systems.