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激光化学气相沉积是近几年发展起来的一种利用激光化学反应直接沉积微区薄膜的新技术,它分为激光热分解沉积和激光光分解沉积两大类.首先介绍了这个方法的基本原理.它的基本理论是激光与物质的相互作用.涉及到大分子的光吸收激发、分子内部的能量转移、单步和多步光解离、表面附着与再燕发、表面扩散与分子团的形成、成膜机理等问题.介绍了常用的激光光分解沉积法,激光热分解沉积法和复合沉积法的基本原理、实验装置.最后介绍了激光化学气相沉积法在沉积金属薄膜、氧化物薄膜、非晶硅太阳电池薄膜中的应用.并指出这个方法在工具钢表面上沉积碳化钛薄膜和Si_3N_4硬质薄膜中亦有一定的应用前景.t
Laser chemical vapor deposition is a new technology developed in recent years, which utilizes the laser chemical reaction to deposit the micro-area film directly. It is divided into two categories: laser pyrolysis deposition and laser photolysis deposition.First, the basic principle of this method Its basic theory is the interaction between laser and matter, which involves the absorption of light by macromolecules, the energy transfer within molecules, the single-step and multi-step photodissociation, surface attachment and re-emergence, surface diffusion and molecular groups Forming and film-forming mechanism, etc. The basic principles and experimental devices of laser photodecomposition, laser thermal decomposition and composite deposition are introduced.Laser chemical vapor deposition (CVD) is used to deposit metal films, oxide films , The application of amorphous silicon solar cell film, and pointed out that this method also has certain application prospects in the deposition of titanium carbide film and Si_3N_4 hard film on the surface of tool steel.t