向千兆位拓进的光学光刻技术Ｍ．ＤａｖｉｄＬｅｖｅｎｓｏｎ各种光刻技术的开发使ｉ线（３６５ｎｍ）和深紫外（ＤＵＶ）光学光刻技术的寿命大有希望延伸到亚半微米时代。这些新技术包括离轴照明、光学邻近效应校正、不同类型的移相掩模及其它方法。似乎还没有一种单独的... Optical lithography to the gigabit extension M. David Levenson The development of various lithography technologies has the potential to extend the lifetime of i-line (365nm) and deep-ultraviolet (DUV) lithography into the sub-micron era. These new technologies include off-axis illumination, optical proximity correction, different types of phase-shift masks, and other methods. It seems there is not a single ...