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本文报道—台自制的光学投影亚微米量级微细加工用的KrF准分子激光振荡-放大系统,并对其设计和运转性能加以讨论.该系统在200Hz重复率运转时其谱线漂移小于5×10-4 nm,谱线宽度为2.3×10-8 nm,平均功率达24.4W.
高重复率、高平均功率窄线宽KrF准分子激光系统的研究
【摘 要】
：
本文报道—台自制的光学投影亚微米量级微细加工用的KrF准分子激光振荡-放大系统,并对其设计和运转性能加以讨论.该系统在200Hz重复率运转时其谱线漂移小于5×10-4 nm,谱线宽度为2.3×10-8 nm,平均功率达24.4W.
【机 构】
：
日本国东京LEONIX公司中国科学院上海光学精密机械研究所,上海201800
【出 处】
：
光学学报
【发表日期】
：
1992年12期
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