论文部分内容阅读
作者利用扫描电子显微镜(SEM)、X-射线衍射仪(XRD),俄歇电子能谱仪(AES)和X—射线光电子能谱仪(XPS)等对MoS_2-Au共溅膜的形貌和结构进行了观察与分析,并就这种膜的厚度对耐磨寿命的影响及其抗湿性与MoS_2溅射膜的作了比较,认为共溅膜的柱状聚集体结构是其具有良好性能的原因。溅射时氩气压强对MoS_2-Au膜结构和性能影响的研究结果表明,不同氩气压强下得到的MoS_2之结晶度不同,因而共溅膜的摩擦学性能也不相同。作者还就膜与底材的结合强度同耐磨寿命的关系,以及底材表面缺陷对膜结构的影响进行了讨论。
The morphology and morphology of the MoS_2-Au co-sputtering film were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) Structure of the film was observed and analyzed, and the influence of the thickness of the film on the wear life and the moisture resistance of the sputtered film were compared with those of the MoS 2 film. It is considered that the columnar aggregate structure of the sputtered film is the reason for its good performance . The effect of argon pressure on the structure and properties of MoS_2-Au films during sputtering shows that the crystallinity of MoS_2 obtained under different argon pressures is different, and the tribological properties of the sputtered films are also different. The author also discussed the relationship between the bonding strength of the film and the substrate and the wear life, as well as the influence of the substrate surface defects on the film structure.