在硅——二氧化硅之间有个过渡层,过渡层中存在着界面态和固定电荷,它们能影响晶体管和集成电路的性能。本文简单介绍了界面态和固定电荷的特性,以及它们如何影响器件性能的。同时也介绍了控制界面态密度和固定电荷密度的一些方法。这些方法能有效地提高半导体器件的性能。 There is a transition layer between silicon and silicon dioxide, there is interface state and fixed charges in the transition layer, and they can affect the performance of transistors and integrated circuits. This article gives a brief introduction of the properties of interface states and fixed charges, and how they affect device performance. Some methods of controlling the density of states and the density of fixed charges are also introduced. These methods can effectively improve the performance of semiconductor devices.