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采用多靶磁控共溅射技术,利用高纯度Al,Mg和B单质靶材为溅射源,室温下在单晶Si(100)表面上成功制备了低摩擦系数的非晶态Al-Mg-B硬质薄膜.通过改变Al/Mg混合靶体积配比及靶材溅射功率来调控薄膜成分,最终制备的Al-Mg-B薄膜成分接近AlMgB_(14)相的元素成分比,其Vickers硬度约为32 GPa.XRD及HR-TEM分析表明.制备的薄膜均为非晶态XPS测试表明薄膜内部存在B-B及Al-B单键;FTIR进一步测试表明,在波数1100 cm~(-1)处出现较为明显的振动吸收峰,证明制备的薄膜中含有B_(12)二十面体结构,这也是薄膜具有超硬性的主要原因.薄膜摩擦磨损测试表明薄膜摩擦系数在0.07左右.
A multi-target magnetron sputtering technique was used to prepare amorphous Al-Mg with low friction coefficient on the surface of single-crystal Si (100) by using high-purity Al, Mg and B single- -B hard films.The composition of Al-Mg-B thin films was controlled by altering the volume ratio of Al / Mg mixed target and sputtering power of target, the composition of Al-Mg-B thin films was close to that of AlMgB_ (14) Hardness of about 32 GPa.XRD and HR-TEM analysis showed that the prepared films are amorphous XPS test showed that the film has BB and Al-B single bond inside; FTIR further tests showed that the wavenumber 1100 cm -1 The obvious vibration absorption peak appears, which proves that there is B 12 icosahedral structure in the prepared film, which is also the main reason for the film superhardness.Friction and wear test of the film shows that the film friction coefficient is about 0.07.