论文部分内容阅读
以真空蒸镀法在K9基底上制备了TeOx 单层薄膜。采用特定的定位方法 ,使用原子力显微镜对不同记录功率下薄膜中短波长静态记录点 (5 14.5nm)的结构进行了分析。实验结果表明薄膜具有良好的记录灵敏性 ,在记录功率 1.5mW时就可产生较高的反射率对比度。记录点具有明显的凹陷和凸起结构 ,随着记录功率的提高 ,凹陷和凸起增强 ,记录点增大。记录点的形态结构和记录前后反射率对比度是直接相关的。研究揭示了原子力显微镜在提高薄膜存储特性如信噪比、存储密度等方面的分析功能。
TeOx single-layer thin films were prepared on K9 by vacuum evaporation. Using a specific positioning method, atomic force microscopy was used to analyze the structure of short wavelength static recording points (5 14.5nm) in films with different recording powers. Experimental results show that the film has a good recording sensitivity, the recording power of 1.5mW can produce a high reflectivity contrast. The recorded points have obvious concave and convex structures. As the recording power is increased, the depressions and protrusions are enhanced and the recording points are increased. The morphological structure of the recorded spots is directly related to the reflectance contrast before and after recording. The study revealed the analytical capabilities of atomic force microscopy in improving film storage characteristics such as signal-to-noise ratio, storage density, and the like.