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碳薄膜因纯度高、导电、原子序数小和能耐受较大的粒子流轰击而有很多用途。如低能核反应中的穿透靶底、电子显微镜的样品承托膜、串列式静电加速器中的电荷剥离器、束一箔谱学中的激发膜等都常采用碳薄膜。它的优点是可以做得很薄(几μg/cm~2)而无砂眼,对粒子流透明度好;并因对粒子散射小很少影响束流特性。在作穿透靶底用时,因有较好的化学稳定性与热稳定性,可以将很多靶物质蒸发到碳膜的表面上;并由于碳棒纯度高(光谱纯),不易有污染核反应出现。
Carbon thin films have many uses due to their high purity, conductivity, small atomic number, and their ability to withstand larger particle flow. Such as low-energy nuclear reaction in the penetration through the target, electron microscopy sample supporting film, tandem electrostatic accelerator in the charge stripper, beam-foil spectroscopy excitation film are often used carbon film. Its advantage is that it can be made very thin (a few μg / cm 2) without blistering and has good transparency to the particle flow; and it has little influence on the beam characteristics due to small scattering of particles. In penetrating the end of the target, due to good chemical stability and thermal stability, a lot of target material can be evaporated to the surface of the carbon film; and due to high purity carbon rod (pure spectrum), less prone to contamination Nuclear reaction .