【摘 要】
：
Image distortion problem is key issue in DMD digital lithography system,in this paper,quality optimization algorithm of digital lithography based on improved particle swarm optimization algorithm is p
【机 构】
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Nanchang Hangkong University China
【出 处】
：
2016年第二届光子学与光学工程国际会议暨第八届西部光子学会议
论文部分内容阅读
Image distortion problem is key issue in DMD digital lithography system,in this paper,quality optimization algorithm of digital lithography based on improved particle swarm optimization algorithm is proposed.The fidelity is adopted as the fitness function.The pixels in the mask pattern are used as particles,and then optimization is implemented by updating the velocities and positions of these particles.Two different graphs are used to verify the method,image quality optimization of the standard particle swarm optimization algorithm and the steepest descent gradient descent algorithm,the pattern errors are reduced by 95.48%,91.95%and 92.78%,87.28%,respectively.
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