Diffusivity of Oxygen Vacancies in the passive films of Cr doped aluminum by means of point defect m

来源 :International Conference on Nanoscience & Technology,China 2 | 被引量 : 0次 | 上传用户：AceAcer

【摘要】

：

【作者】

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Cheng Zeng Yunhan Ling Jun Zhang Junji Gu

【机构】

：

Laboratory of Advanced Materials,School of Materials Sciences and Engineering,Tsinghua University,Be

【出处】

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International Conference on Nanoscience & Technology,China 2

【发表日期】

：

2013年3期

【关键词】

：

aluminum passivity vacancy point defect model

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　　The outstanding oxidation resistance of Cr doped aluminum alloy results from the presence of its nanoscale passive film on the metallic surface.The diffusive behavior of such unique film is of great importance in the understanding of passivity nature.The point defect model (PDM) provides an analytical description of the growth and breakdown of the passive film on the atomic scale in the explaining and predicting many empirical corrosion phenomena.In the present work, The diffusivity of oxygen vacancies in the passive film formed on Cr-doped aluminum was evaluated by means of capacitance measurement and point defect model (PDM).

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Diffusivity of Oxygen Vacancies in the passive films of Cr doped aluminum by means of point defect m

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